高温高压光学浮区炉

高温高压光学浮区炉


德国SciDre公司推出的高温高压光学浮区法单晶炉能够提供2200–3000℃以上的生长温度,晶体生长腔最大压力可达300bar,甚至10-5mbar的高真空。适用于生长各种超导材料单晶,介电和磁性材料单晶,氧化物及金属间化合物单晶等。

 


应用领域


适用于生长各种超导材料单晶,介电和磁性材料单晶,氧化物及金属间化合物单晶等。

可实现2600°C及以上高温(最高可达3000°C);多种压力规格可选,最高压力可达300bar;适用于多种超导材料优质单晶生长

耐高温、耐高压、高真空、

高透光率、拆装简便的样品腔


由德国弗劳恩霍夫应用光

和精密工程研究所优化设计的高反射率镜面,

镜体位置可由高精度步进马达控制调节


光阑式光强控制器

更方便地调节熔区温度,延长灯泡寿命 


仿真化触屏控制软件

界面友好,操作简单


熔区测温选件专利测温技术

可实时监测加热区温度


多路独立气路控制选件

可控制N2、O2、Ar、空气等的流量和压力, 

并可对气体进行比例混合与熔区进行反应


气体除杂选件

可使高压氩气中的氧含量达到10-12ppm


退火选件

可对离开熔区的单晶棒提供

最高1100℃退火温度和高压氧环境



SciDre单晶炉特点


► 采用垂直式光路设计

► 采用高照度短弧氙灯,多种功率规格可选

► 熔区温度:>3000℃

► 熔区压力:10bar/50bar/100bar/150bar/300bar等多种规格可选

► 氧气/氩气/氮气/空气/混合气等多种气路可选

► 采用光栅控制技术,加热功率从0-100% 连续可调

► 样品腔可实现最低10-5mbar真空环境

► 丰富的可升级选件



SciDre单晶炉技术参数


熔区温度:最高2000 - 3000℃以上

熔区压力:最大10、50、100、150、300 bar可选

熔区真空:1*10-2 mbar或 1*10-5 mbar可选

熔区气氛:Ar、O2、N2等可选

气体流量:0.25 – 1 L/min流量可控

氙灯功率:3kW至15kW可选

料棒台尺寸:6.8mm或9.8mm可选

拉伸速率:0.1-50mm/h

调节速率:0.6 mm/s

拉伸尺寸:130mm,150mm,195mm可选

旋转速率:0-70rpm

用电功率:400V三相 63A 50Hz 

主机尺寸:330cm*163cm*92cm (不同规格略有差异)



■  锂离子电池领域最新应用


锂离子电池由于具有能量密度高、寿命长、充电快、安全可靠、绿色环保等诸多优异性能,与当今人民的日常生活已密不可分,在手机、电脑、电动车、电动汽车、航空航天等领域均有广泛的应用。其中,Li2FeSiO4作为新一代锂离子电池阴极材料,由于具有价格低廉、环境友好、安全性好等优势,在大型动力锂离子电池应用方面具有良好的前景。然而,Li2FeSiO4材料在不同温度具有不同的结构相(∼ 400 °C :Pmn21,  ∼ 700 °C :P121/n1, and ∼ 900 °C :Pmnb),因此,研究其不同结构的电化学性质对于进一步对其进行改性研究尤为重要。

 

Waldemar Hergetta等人[1]采用高压光学浮区法获得了高温相(Pmnb)Li2FeSiO4单晶,并研究了晶体生长工艺参数对杂相的影响,相关结果已发表在Journal of Crystal Growth。作者所采用的高压光学浮区炉为德国SciDre公司的HKZ高压光学浮区法单晶炉


温度梯度分布[1]

XRD图谱及晶体实物图片[1]


参考文献:

[1]. Waldemar Hergett, Christoph Neef, Hans-Peter Meyer, Rüdiger Klingeler, Challenges in the crystal growth of Li2FeSiO4, Journal of Crystal Growth, Volume 556, 2021, 125995,ISSN 0022-0248.



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中国科学院物理研究所

中国科学院固体物理研究所

北京师范大学

中山大学

南昌大学

上海大学