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ALD应用案例3:HfO2辅助DNA测序
Slow DNA Transport through Nanopores in Hafnium Oxide Membranes
Joseph Larkin, Robert Henley, David C. Bell, Tzahi Cohen-Karni, Jacob K. Rosenstein, and Meni Wanunu,
Departments of Physics and Chemistry/Chemical Biology, Northeastern University, Boston, Massachusetts 02115, United States, School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States, David H. Koch Institute for Integrative Cancer Research, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States, and School of Engineering, Brown University, Providence, Rhode Island 02912, United States.
 
摘要:
研究展示了双链和单链DNA在超薄(2.7nm)独立HfO2薄膜的纳米空洞中输运的研究。超薄HfO2的高化学稳定度使得在小于2nm直径的纳米空洞中进行几个小时的长时间实验成为可能。在实验中研究着观察到大于50000DNA易位伴随着不可探测到的空洞扩张。DNA平均速率比在相当的Si3N2空洞中输运的速度慢,证明了HfO2纳米空洞与核算具有更好的物理化学亲和力,从而促使减慢DNA在纳米空洞中的输运。
 
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